|
Epitaxial GaN on Sapphire Structures (2" wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
|
GaN layer thickness up to 8um
|
Poland |
1 | |
|
GaN layer thickness up to 8um
|
Poland |
1 | |
|
GaN layer thickness up to 1.5um
|
Poland |
1 | |
|
GaN layer thickness up to 4um
|
Poland |
1 | |
|
HEMT structure |
Poland |
1 | |
|
LED structure (395-440nm wavelength)
|
Poland |
1 | | |
|
Epitaxial GaN on bulk GaN Structures (1", 1.5" and 2" wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
|
GaN on bulk GaN
|
Poland |
1 | |
|
GaN on bulk GaN
|
Poland |
1 | |
|
GaN on bulk GaN
|
Poland |
1 | |
|
LED structures (405nm-430nm wavelength)
|
Poland |
1 | |
|
HEMT structures semi-insulating GaN
|
Poland |
1 | | |
|
Epitaxial GaN on SiC Structures (2" wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
|
GaN on n-type or semi-insulating SiC
|
Poland |
1 | |
|
GaN on n-type or semi-insulating SiC
|
Poland |
1 | |
|
GaN on n-type or semi-insulating SiC
|
Poland |
1 | | |
|
Epitaxial GaN on Silicon Structures (2" wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
|
up to 1.2um GaN on Silicon substrate (111)
|
Poland |
1 | | |
|
Epitaxial SiC on SiC Structures (2" wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
|
n-type SiC layer (doped with Nitrogen)
|
Poland |
1 | |
|
p-type SiC layer (doped with Aluminium)
|
Poland |
1 | |
|
undoped SiC layer
|
Poland |
1 | |
|
Schottky diode structure
|
Poland |
1 | |
|
PIN diode structure
|
Poland |
1 | |
|
JFET structure
|
Poland |
1 | |
|
MISFET structure
|
Poland |
1 | | |
|
Epitaxial AlN on SiC Structures (2" wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
| undoped AlN on SiC
|
 |
|
undoped AlN on SiC
|
Poland |
1 | | |
|
Epitaxial Graphene on SiC Structures (up to 20mm x 20mm wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
|
Graphene on n-type SiC
|
Poland |
1 | |
|
Graphene on semi-insuling SiC
|
Poland |
1 | | |
|
Epitaxial InAlGaAs on GaAs Structures (2" wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
|
n-type, p-type and semi-insulating GaAs on GaAs
|
Poland |
1 | |
|
InGaAsP/GaAs (typically latice-matched)
|
Poland |
1 | |
|
AlAs/GaAs
|
Poland |
1 | |
|
InAs/GaAs quantum dots
|
Poland |
1 | |
|
GaAsP (typically strained)
|
Poland |
1 | |
|
InGaAlP (typically latice-matched)
|
Poland |
1 | |
|
InGaP/GaAs (typically latice-matched)
|
Poland |
1 | |
|
AlGaAs/GaAs QW edge emitting lasers (680 - 870nm)
|
Poland |
1 | |
|
AlGaAs/GaAs VCSELs
|
Poland |
1 | |
|
AlGaAs/GaAs HEMTs
|
Poland |
1 | |
|
AlGaAs/GaAs varactors
|
Poland |
1 | |
|
GaAsP/GaAs strained QW edge emitting lasers
|
Poland |
1 | |
|
InGaAsP/GaAs QW lasers 808nm
|
Poland |
1 | |
|
InGaAs/AlGaAs/GaAs strained QW lasers 800-1000nm
|
Poland |
1 | |
|
InGaAs/GaAs and InAs/GaAs QD lasers
|
Poland |
1 | |
|
AlGaAs/GaAs passive waveguides
|
Poland |
1 | | |
|
Epitaxial InAlGaAsP on InP Structures (2" wafers)
| Reference |
Specification |
Producer |
Packing |
Comments |
|
n-type, p-type and undoped InP on InP
|
Poland |
1 | |
|
InGaAs/InP (typically latice-matched)
|
Poland |
1 | |
|
InGaAsP/InP (typically latice-matched)
|
Poland |
1 | |
|
InAlAs/InP (typically latice-matched)
|
Poland |
1 | |
|
InAlGaAs/InP (typically latice-matched)
|
Poland |
1 | |
|
InGaAsP/InP QW edge emitting lasers and SOAs 1300-1600nm
|
Poland |
1 | |
|
InGaAs/InP edge emitting lasers 1550nm
|
Poland |
1 | |
|
InGaAsP/InP VCSEL structures
|
Poland |
1 | |
|
InAlGaAs/InP edge emitting and VCSEL structures
|
Poland |
1 | |
|
InGaAsP/InP passive devices
|
Poland |
1 | |
|
InP - based photodetectors
|
Poland |
1 | |
|
InAlAs/InGaAs/InP HEMTs
|
Poland |
1 | | |
|